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The centre offers MTech and PhD degree programs in the area of nano science and engineering.

Clean room 1 (2)M. Engg. in Semiconductor Technology:
CeNSE is launching a one-year M.Engg in Semiconductor Technology from the Academic year 2024-25 (Aug'24). The objective is to align with the India Semiconductor Mission to cater to the fast-growing semiconductor ecosystem in the country in particular and in the world in general. The semiconductor industry is vast and has its requirements not just from the core subjects but from a vast range of fields. This program is designed be attractive to students from multiple streams & backgrounds while at the same time aligning with the current industrial relevance of semiconductor technology vis-a-vis the demand for skilled workforce and cutting-edge R&D in semiconductor technology.
Along with guidance from experts in the field, the selected students benefit from Industrial interactions at CeNSE, CeNSE and cutting-edge R&D facilities.
Selection: 70% based on GATE score & CGPA >=8.0 (for students from CFTIs) + 30% based on interview
Duration: One year
Eligibility: BE / B Tech or equivalent degree in any discipline or M Sc or equivalent degree in electronics engineering, electrical engineering, mechanical engineering, materials engineering, chemical engineering, instrumentation engineering, physics, applied physics, photonics, material science, chemistry, etc.
Approximately 20 students will be admitted each year. The candidates will be shortlisted based on GATE ranking and CGPA>=8.0 (for students from CFTIs) and will be called for an interview. Students appearing for the interview are expected to have a good grasp of the fundamentals in their respective subjects. The interview process tests the subject knowledge as well as the aptitude and interest to pursue interdisciplinary course work in nano science and engineering. The final selection will be made based on the performance at the interview
For more course details click here

To apply click here

Joint Mtech in Semiconductor Technology:
A Joint Master’s degree between the Center for Nanoscience and Engineering, IISc and Taiwanese Universities being launched from the academic year 2024-25 (Aug'24) would enable a strong relationship between Indian academia and the semiconductor industry in Taiwan. This program enables students to access the semiconductor workplace during their Master’s program through academic/industry internships and projects. This helps India stay abreast in the cutting-edge semiconductor technology employment sector as per the India Semiconductor Mission. The collaborating Taiwanese universities include National University of Taiwan, National Chiao Tung Yang Ming University, National Tsing Hua University and National Sun Yat-Sen University.
Duration: Two years
Eligibility & Selection:

a. Same as IISc’s MTech in Semiconductor Technology when IISc is the parent institute.

b. Same as Taiwanese University’s criteria when they are the parent institute.

Aproximately 1-2 students will be admitted each year for a collaborative program with each Taiwanese university. The selected candidates will spend one year in India and the other in the Taiwan university. Refer below to the course details under the M.Tech in semiconductor technology for more info.

To apply click here

M. Tech. in Semiconductor Technology:
CeNSE launched its M. Tech in Semiconductor Technology from the Academic year 2023-24 (Aug'23) with optional minors in the thematic areas of Nanoelectronics, Nano-bio, Photonics, Micro-systems & Packaging, Quantum Technology (in collaboration with Indian Quantum Science Initiative) and Materials (in collaboration with Department of Materials Engineering) . The objective is to align with the India Semiconductor Mission to cater to the fast-growing semiconductor ecosystem in the country in particular and in the world in general while retaining the multi-disciplinary flavor of the erstwhile M. Tech program in Nano Science & Engineering. The program is designed be attractive to students from multiple streams & backgrounds while at the same time aligning with the current industrial relevance of semiconductor technology vis-a-vis the demand for skilled workforce and cutting-edge R&D in semiconductor technology.
Along with guidance from experts in the field, the selected students benefit from Industrial interactions at CeNSE, CeNSE and Industrial fellowships, Industrial internships and cutting-edge R&D facilities.
Selection: 70% based on GATE score & CGPA >=8.0 (for students from CFTIs) + 30% based on interview
Duration: Two years
Eligibility: BE / B Tech or equivalent degree in any discipline (with GATE paper in EC,EE,ME,IN,XE-C,MT) OR M Sc or equivalent degree in Electronics or Physics (with GATE paper in PH, IN, EC).

Approximately 20 students will be admitted each year. The candidates will be shortlisted based on GATE ranking and CGPA>=8.0 (for students from CFTIs) and will be called for an interview. Students appearing for the interview are expected to have a good grasp of the fundamentals in their respective subjects. The interview process tests the subject knowledge as well as the aptitude and interest to pursue interdisciplinary course work in nano science and engineering. The final selection will be made based on the performance at the interview.
For more course details Click here

To apply click here

Ph. D. Degree:

Clean room 1 (4)

The Centre offers admission to the Ph. D. degree program of the Institute under two streams, as described below. These programs involve rigorous course work followed by thesis research in various fields, including nanomaterials and nanostructures, electronics, nanofluidics, nanophotonics, nanobiotechnology, plasmonics, sensor systems, computational modeling etc.

Duration: Variable (typically four to six years) although there have been exceptional instances where PhD thesis have been successfully defended under 2.5 years

To apply click here

Direct Admission (denoted as NE stream)

The NE stream provides direct admission to the Ph.D. program of the Centre run by its faculty. Research Areas: Nanomaterials and Nanostructures, Nanoelectronic Devices, Nanoscale motion, Nano-Biophotonics, Nanophotonics, Plasmonics, Sensor Systems and Computational Nanoengineering.

To apply click here

DSC04724

Interdisciplinary Program (denoted as NA stream)

The second stream is an interdisciplinary program conducted by the Centre in conjunction with several other departments across the Institute. A student admitted under this program has two advisors from two different departments. The admission into this program is offered against a specified research project proposed by the two advisors. A list of all available projects is made available to admission seekers before the interview.

Research Areas: Broadly, all areas of nano science and engineering.

Eligibility for the PhD programs:

  • M.E./M.Tech. or equivalent in any discipline.
  • B.E. / B.Tech. or equivalent in any Engineering discipline with a valid score in a recommended GATE paper (See list of papers for M.Tech)
  • M.Sc. or equivalent in any Science discipline with a valid score in a recommended GATE paper (See list of papers for M.Tech)
  • Qualification in one of the following national exams: INSPIRE, Joint CSIR UGC NET for JRF, DBT JRF, UGC NET for JRF and JEST.

To apply click here

M Tech program: Admission to the M Tech program is offered only for the July session.

Ph. D program: Admissions to the PhD program is typically done for the July session. However, a limited number of topic/field specific admissions may be made for the January session as well. 

The admission process starts with filing the online applications at the IISc admissions website. Candidates are shortlisted for interview based on either the scores in one of the national exams or qualification. The detailed eligibility criteria can be found here. The background of students admitted to CeNSE in the past have been mostly from ECE, Physics, Mechanical, Materials disciplines, although there are students pursuing PhD/ MTech at CeNSe whose undergraduate degrees are in areas as diverse as biotechnology or biomedical instrumentation. Shortlisted candidates have to appear for an interview at CeNSE for selection. The interview typically consists of two to three sections, namely math and analytical questions such as plotting functions, basic calculus, differential equations etc, questions related to courses taken during their UG and PG degrees, and questions probing their research aptitude. Admission is based primarily on the performance in the interview and the results are generally announced 2-3 weeks after the interview.

Post Admission M Tech

lab 2M Tech students typically spend most of their first year in taking courses. The course structure consists of a combination of core courses offered at CeNSE, and electives which the student may take from any department at IISc. Towards the end of the first semester, the students need to choose an M Tech thesis project which is an indispensible part of the successful completion of the M Tech program. Work related to the thesis starts during the 2nd semester and should result in a well documented report culminating in the award of the M Tech degree.

Post Admission Ph. D

The most important activity after joining the Ph. D program is the selection of your research advisor. At CeNSE we give absolute freedom to choose a research advisor based on the mutual interest of the student and the faculty member. In order to make a well thought out choice of research advisor, you are encouraged to talk to the faculty members whose work interest you and spend some time in their labs and attend the group meetings to get a good idea of what research in the group involves.

Students typically take between 4-8 courses depending on the prior preparation to gain a solid background in their topic of research. They should maintain a minimum CGPA of 7 throughout the course program. A major step towards the completion of a successful PhD is to pass the comprehensive exam which is held before completing two years in the PhD program. The comprehensive exam is evaluated by a committee of examiners from inside and outside the department. The committee evaluates if sufficient progress has been made towards the research goal. The exam also tests your grasp of the material discussed in your course work. After successfully passing the comprehensive exams, students focus on the research problem intensively leading to the successful defense of the PhD thesis typically within 5 years of joining the program.

Prime Minister’s Research Fellowship (PMRF) Scheme 

For details check https://pmrf.in

 

January - April
NE 200 January - April Technical Writing and Presentation

This course is designed to help students learn to write their manuscripts, technical reports, and dissertations in a competent manner. The do's and don'ts of the English language will be dealt with as a part of the course. Assignments will include writing on topics to a student's research interest, so that the course may benefit each student directly.

Instructor: S.A. Shivashankar

NE 201 January - April Micro and Nano Characterization Methods

This course provides training in the use of various device and material characterization techniques. Optical characterization: optical microscopy, thin film measurement, ellipsometry and Raman spectroscopy; Electrical characterization: Noise in electrical measurements, Resistivity with 2- probe, 4-probe and van der Pauw technique, Hall mobility, DC I-V and High frequency C-V characterization; Mechanical characterization: Laser Doppler vibrometry, Scanning acoustic microscopy, Optical profilometry, and Micro UTM; Material characterization: Scanning electron microscopy, Atomic force microscopy, XRD, and Focused ion beam machining.

Instructors: Akshay Naik and Manoj Varma

NE 202 January - April Micro and Nano Fabrication

This course is designed to give training in device processing at the cleanroom facility. Four specific modules will be covered to realize four different devices i) p-n junction diode, ii) MOS capacitor iii) MEMS Cantilever iv) Microfluidic channel.

Instructors : Shankar Kumar Selvaraja and Sushobhan Avasthi

NE 211 January - April Micro/Nano Mechanics

This is a foundation level course in mechanics which will prepare students to pursue advanced studies related to mechanical phenomena at the micro and nano scales. Basics of continuum theory, continuum hypothesis, elasticity, thermoelasticity, fluid mechanics, heat conduction, electromagnetism, coupled thermal-elastic and electrostatic-elastic systems, MEMS and NEMS structures -- beams, plates, and membranes, scaling of mechanical properties and continuum limits, numerical methods for mechanical modelling, mechanics beyond continuum theory.

Instructors: Rudra Pratap, Akshay Naik and Prosenjit Sen

NE 221 January - April Advanced MEMS Packaging

This course intends to prepare students to pursue advanced topics in more specialized areas of MEMS and Electronic packaging for various real-time applications such as Aero space, Bio-medical, Automotive, commercial, RF and micro fluidics etc. MEMS – An Overview, Miniaturisation, MEMS and Microelectronics -3 levels of Packaging. Critical Issues viz., Interface, Testing & evaluation. Packaging Technologies like Wafer dicing, Bonding and Sealing. Design aspects and Process Flow, Materials for Packaging, Top down System Approach. Different types of Sealing Technologies like brazing, Electron Beam welding and Laser welding. Vacuum Packaging with Moisture Control. 3D Packaging examples. Bio Chips / Lab-on-a chip and micro fluidics, Various RF Packaging, Optical Packaging, Packaging for Aerospace applications. Advanced and Special Packaging techniques – Monolithic, Hybrid etc., Transduction and Special packaging requirements for Absolute, Gauge and differential Pressure measurements, Temperature measurements, Accelerometer and Gyro packaging techniques, Environmental Protection and safety aspects in MEMS Packaging. Reliability Analysis and FMECA. Media Compatibility Case Studies, Challenges/Opportunities/Research frontier.

Instructors:  Prosenjit Sen and M.M. Nayak

NE 310 January - April Photonics technology: Materials and Devices

Optics fundamentals; ray optics, electromagnetic optics and guided wave optics, Light-matter interaction, optical materials; phases, bands and bonds, waveguides, wavelength selective filters, electrons and photons in semiconductors, photons in dielectric, Light-emitting diodes, optical amplifiers and Lasers, non-linear optics, Modulators, Film growth and deposition, defects and strain, III-V semiconductor device technology and processing, silicon photonics technology, photonic integrated circuit in telecommunication and sensors.

Instructor:  Shankar Kumar Selvaraja

NE 313 January - April Lasers: Principles and Systems

This is an intermediate level optics course which builds on the background provided in “Introduction to photonics” offered in our department. Owing to the extensive use of lasers in various fields, we believe a good understanding of these principles is essential for students in all science and engineering disciplines.

Instructor: V R Supradeepa

NE 332 January - April Physics and Mathematics of Molecular Sensing

This course presents a systematic view of the process of sensing molecules with emphasis on bio-sensing using solid state sensors. Molecules that need to be sensed, relevant molecular biology, current technologies for molecular sensing, modeling adsorption-desorption processes, transport of target molecules, noise in molecular recognition, proof-reading schemes, multi-channel sensing, comparison between in-vivo sensing circuits and solid state biosensors.

Instructor: Manoj Varma

August - December
NE 201 August - December Micro and Nano Characterization Methods

This course provides training in the use of various device and material characterization techniques. Optical characterization: optical microscopy, thin film measurement, ellipsometry and Raman spectroscopy; Electrical characterization: Noise in electrical measurements, Resistivity with 2- probe, 4-probe and van der Pauw technique, Hall mobility, DC I-V and High frequency C-V characterization; Mechanical characterization: Laser Doppler vibrometry, Scanning acoustic microscopy, Optical profilometry, and Micro UTM; Material characterization: Scanning electron microscopy, Atomic force microscopy, XRD, and Focused ion beam machining.

Instructors:  Akshay Naik and Manoj Varma.

NE 202 August - December Micro and Nano Fabrication

This course is designed to give training in device processing at the cleanroom facility. Four specific modules will be covered to realize four different devices :

  1. p-n junction diode
  2.  MOS capacitor
  3. MEMS Cantilever
  4. Microfluidic channel.

Instructors: Shankar Kumar Selvaraja and Sushobhan Avasthi

NE 203 August - December Advanced micro- and nanofabrication technology and process

Introduction and overview of micro and nano fabrication technology. Safety and contamination issues in a cleanroom. Overview of cleanroom hazards. Basic process flow structuring. Wafer type selection and cleaning methods. Additive fabrication processes. Material deposition methods. Overview of physical vapour deposition methods (thermal, e-beam, molecular beam evaporation) and chemical vapour deposition methods (PE-CVD, MOCVD, CBE, ALD). Pulsed laser deposition (PLD), pulsed electron deposition (PED). Doping: diffusion and ion implant techniques. Optical lithography fundamentals, contact lithography, stepper/canner lithography, holographic lithography, direct-laser writing. Lithography enhancement methods and lithography modelling. Non-optical lithography; E-beam lithography, ion beam patterning, bottom-up patterning techniques. Etching process: dry and wet. Wet etch fundamentals, isotropic, directional and anisotropic processes. Dry etching process fundamentals, plasma assisted etch process, Deep Reactive Ion Etching (DRIE), Through Silicon Vias (TSV). Isotropic release etch. Chemical-mechanical polishing (CMP), lapping and polishing. Packaging and assembly, protective encapsulating materials and their deposition. Wafer dicing, scribing and cleaving. Mechanical scribing and laser scribing, Wafer bonding, die-bonding. Wire bonding, die-bonding. Chip-mounting techniques.

Instructors: Shankar Kumar Selvaraja and Sushobhan Avasthi

NE 205 August - December Semiconductor Devices and Integrated Circuit Technology

This is a foundation level course in the area of electronic device technology. Band structure and carrier statistics, Intrinsic and extrinsic semiconductor, Carrier transport, p-n junction, Metal-semiconductor junction, Bipolar Junction Transistor, Heterojunction, MOS capacitor, Capacitance-Voltage characteristics, MOSFET, JEFET, Current-Voltage characteristics, Light Emitting Diode, Photodiode, Photovoltaics, Charge Coupled Device Integrated circuit processing, Oxidation, Ion implantation, Annealing, Diffusion, Wet etching and dry plasma etching, Physical vapour deposition, Chemical vapour deposition, Atomic layer deposition, Photolithography, Electron beam lithography, Chemical mechanical polishing, Electroplating, CMOS process integration, Moore’s law, CMOS technology scaling, Short channel effects, Introduction to Technology CAD, Device and Process simulation and modelling.

Instructor: Digbijoy N. Nath

NE 213 August - December Introduction to Photonics

This is a foundation level optics course which intends to prepare students to pursue advanced topics in more specialized areas of optics such as biophotonics, nanophotonics, non-linear optics etc. Classical and quantum descriptions of light, diffraction, interference, polarization. Fourier optics, holography, imaging, anisotropic materials, optical modulation, waveguides and fiber optics, coherence and lasers, plasmonics.

Instructors: Shankar Kumar Selvaraja and Ambarish Ghosh

NE 215 August - December Applied Solid State Physics

This course is intended to build a basic understanding of solid state science, on which much of modern device technology is built, and therefore includes elementary quantum mechanics. Review of Quantum Mechanics and solid state physics, Solution of Schrodinger equation for band structure, crystal potentials leading to crystal structure, reciprocal lattice, structure-property correlation, Crystal structures and defects, X-ray diffraction, lattice dynamics, Quantum mechanics and statistical mechanics, thermal properties, electrons in metals, semiconductors and insulators, magnetic properties, dielectric properties, confinement effects.

Instructors: Akshay Naik and S A Shiva Shankar

NE 222 August - December MEMS: Modeling, Design, and Implementation

This course discusses all aspects of MEMS technology – from modeling, design, fabrication, process integration, and final implementation. Modeling and design will cover blockset models of MEMS transducers, generally implemented in SIMULINK or MATLAB. Detailed multiphysics modeling may require COMSOL simulations. The course also covers MEMS specific micromachining concepts such as bulk micromachining, surface micromachining and related technologies, micromachining for high aspect ratio microstructures, glass and polymer micromachining, and wafer bonding technologies. Specific case studies covered include Pressure Sensors, Microphone, Accelerometers, Comb-drives for electrostatic actuation and sensing, and RF MEMS. Integration of micromachined mechanical devices with microelectronics circuits for complete implementation is also discussed.

Instructors: K.N. Bhat and Saurabh A. Chandorkar

NE 223 August - December Analog Circuits and Embedded System for Sensors

The Internet of Things (IoT) revolution is driven by confluence of high performance sensors, powerful computation power of microcontrollers and wireless technology. The performance of sensors is not only governed by inherent characteristics of sensor such as sensitivity, linearity and response time but also the front end interfacing analog circuit and backend processing in digital domain. The goal of this course is to explore the electronics that needs to be incorporated to create sensor systems and to learn the trade-offs in design of circuits to maximize performance subject to real life design constraints.

The course has both a theory (2 credits) and a hands-on lab (1 credit) element to it. The course starts out with introduction to basic circuit elements and smaller circuit building blocks with emphasis on reading and understand the datasheets for components to make the appropriate choice to pick for the circuit at hand.  Digital IOs and some basics of digital logic will be explored thereafter leading eventually to programming with Arduino microcontroller. In the end, the course takes a closer look at building systems.

The lab portion of the course will serve to explore trade-offs in circuit design as well as give a practical feel for dealing with noise in circuits and building systems. Circuit simulation will also be emphasized in the lab course in conjunction with back of the envelop calculations to make sense of the simulations. There will be also be a final project wherein the students get an opportunity to build a sensor system in its entirety and learn planned system design, tracking down sources of noise and learning to define interfaces cleanly for smooth integration in the end.

The course content is as follows:

Basic Circuit Analysis and Passive Components; Introduction to semiconductor devices and circuits involving Diodes, BJT, MOSFET and JFET; Opamp circuits: Transimpedance amplifier, Instrumentation amplifier, Comparator, Precision DMM application; Tradeoffs between power, noise, settling time and cost; Survey of sensors and their datasheets; Active Filters and RF Oscillators; Introduction to digital logic, State Machines, Digital IO; Microcontroller programming; Communication protocols for sensor interfacing; System building

Instructors: Saurabh A. Chandorkar and Krishna Prasad

 

NE 231 August - December Microfluidics

This is a foundation course discussing various phenomena related to fluids and fluid-interfaces at micro-nano scale. This is a pre-requisite for advanced courses and research work related to micro-nano fluidics. Transport in fluids, equations of change, flow at micro-scale, hydraulic circuit analysis, passive scalar transport, potential fluid flow, stokes flow Electrostatics and electrodynamics, electroosmosis, electrical double layer (EDL), zeta potential, species and charge transport, particle electrophoresis, AC electrokinetics Surface tension, hysteresis and elasticity of triple line, wetting and long range forces, hydrodynamics of interfaces, surfactants, special interfaces Suspensions, rheology, nanofluidics, thick-EDL systems, DNA transport and analysis.

Instructor: Prosenjit Sen

NE 241 August - December Material Synthesis: Quantum Dots To Bulk Crystals

All device fabrication is preceded by material synthesis which in turn determines material microstructure, properties and device performance. The aim of this course is to introduce the student to the principles that help control growth. Crystallography; Surfaces and Interfaces; Thermodynamics, Kinetics, and Mechanisms of Nucleation and Growth of Crystals ; Applications to growth from solutions, melts and vapors (Chemical vapor deposition an Physical vapor deposition methods); Stress effects in film growth.

Instructor: Srinivasan Raghavan

NE 250 August - December Entrepreneurship, Ethics and Societal Impact

This course is intended to give an exposure to issues involved in translating the technologies from lab to the field. Various steps and issues involved in productization and business development will be clarified, drawing from experiences of successful entrepreneurs in high technology areas. The intricate relationship between technology, society and ethics will also be addressed with illustrations from people involved in working with the grass root levels of the society.

Instructor: Navakanta Bhat

NE 312 August - December Nonlinear and Ultrafast Photonics

This is an intermediate level optics course which builds on the background provided in “Introduction to photonics” offered in our department. Owing to the extensive use of nonlinear optical phenomena and Ultrafast lasers in various fields, we believe a good understanding of these principles is essential for students in all science and engineering disciplines, in particular students involved in the area of Photonics, RF and Microwave systems, Optical Instrumentation and Lightwave (Fiber-optic) Communications. In addition, this course intends to prepare students to pursue advanced topics in more specialized areas of optics such as Biomedical Imaging, Quantum optics, Intense field phenomena etc.

Instructor: V. R. Supradeepa

 

Course timings for the semester (Aug - Dec 2024) is as follows :

Sl. No Course code Topic Instructors Time Day Classroom First Class Teams Link
1. NE 200A / NE200    

Technical Writing and Presentation

Prof. Shivashankar

03.30 pm to 05.30 pm

Wednesday

CeNSE Seminar Hall

07th Aug

Teams Link
2. NE 201A

Theory of structural and functional characterization

Prof. Akshay Naik / Prof. Gayathri Pillai/ Prof. Pavan Nukala

12.00 pm to 1.00 pm

Monday Wednesday Friday

FF-11, CeNSE

12th Aug

Teams Link
3. NE 201B Lab for structural and functional characterization Prof. Akshay Naik 12:00 pm to 1:00 pm Tuesday Thursday

FF-11, CeNSE

13th Aug

Teams Link
4 NE 202 Micro & Nano Fabrication Lab Prof. Sushobhan Avasthi 2:00 pm to 5:00pm Monday Tuesday Wednesday Thursay
Lab
First class- CeNSE Seminar Hall
06th Aug Teams Link
5. NE 203A

Advanced micro and nanofabrication technology and process

Prof. Shankar Kumar Selvaraja/ Prof. Sushobhan Avasthi

11.30 am to 1.00 pm Tuesday 5pm-6:30pm

Tuesday Thursday

IDR-GF12-Classroom-3

06th Aug

Teams Link
6. NE 206A / NE206 

Semiconductor Device Physics: Basics Devices

Prof. Sushobhan Avasthi

09.00 am to 10.00 am

Monday Wednesday Friday

IDR-GF12-Classroom-3

07th Aug

Teams Link
7. NE 213   

Introduction to Photonics

Prof. Ambarish Ghosh/ Prof. Shankar  Kumar Selvaraja

10.00 am to 11.30 am

Tuesday Thursday

IDR-GF10-Classroom-1

06th Aug

Teams Link
8. NE 215    

Applied Solid State Physics 

Prof. Chandan Kumar/ Prof. Dhavala Suri

02:00 pm to 03.30 pm

Monday Wednesday

FF-11, CeNSE

07th Aug

Teams Link
9. NE 222  

MEMS: Modeling, Design, and Implementation  

Prof. Saurabh Arun Chandorkar/ Prof. Gayathri Pillai

03.30 pm to 5.00 pm

Tuesday Friday

FF-11, CeNSE

06th Aug

Teams Link
10. NE 231 

Microfluidics 

Prof. Prosenjit Sen 

10.00 am to 11.00 am

Monday Wednesday Friday

FF-11, CeNSE

07th Aug

Teams Link
11.

NE 240

Materials design principles for electronic, electromechanical and optical functions  

Prof. Pavan Nukala 

02.00 pm to 03.30 pm

Tuesday Thursday

FF-11 CeNSE

06th Aug

Teams Link
12. NE 250 

Entrepreneurship, Ethics and Societal Impact 

Prof. Srinivasan Raghavan / Prof. Navakanta Bhat

05.00 pm to 06.00 pm

Monday

FF-11, CeNSE

12th Aug

 

Teams Link
13. NE 281   

Statistical and probabilistic data analysis techniques 

Prof. Manoj Varma

10.00 am to 11.30 am

Tuesday Thursday

FF-11, CeNSE

06th Aug

Teams Link
14. NE 303  

Semiconductor Process Integration

Prof. Shankar Kumar Selvaraja / Prof. Saurabh Arun Chandorkar

11:00 am to 12:00 pm

Friday 5:00pm to 6:00pm

Monday Wednesday

FF-11, CeNSE

07th Aug

Teams Link
15. NE 313 

Lasers: Principles and Systems  

Prof. Balaswamy Velpula / Prof. Supradeepa V R 04:00 pm to 05:00 pm Monday Wednesday Friday

MP-30, ECE

07th Aug

Teams Link
16. NE 314 Semiconductor Opto-electronics and Photovoltaics Prof. Aditya Sadhanala 08:30 am to 10:00 am Tuesday Thursday

FF-11, CeNSE

08th Aug

Teams Link

Course timings for the semester (Jan - April 2024) is as follows:

Sl. No Course code Topic Instructors Time Day First Class Classroom
1. NE 201 B 0:2 Lab for structural and functional characterization Prof.Akshay Naik 2 to 5 pm Monday to Friday 04th Jan

Lab

Teams link

2. NE 202 0:2 Micro and Nano Characterization Prof.Sushobhan Avasthi 2 to 4 pm Monday Wednesday Thursday Friday 03rd Jan

Lab

Teams link

3