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Interface Charge Engineering at Atomic Layer Deposited (ALD) dielectric/III-Nitride Interfaces

TitleInterface Charge Engineering at Atomic Layer Deposited (ALD) dielectric/III-Nitride Interfaces
Publication TypeJournal Article
Year of Publication2013
AuthorsHung, T-H, Krishnamoorthy, S, Esposto, M, Nath, DN, Park, PSung, Rajan, S
JournalApplied Physics Letters
Volume102
Pagination072105