Heterojunction Lab
Home
Team
News
Publications
Talks
Research Areas
Contact
Effect of Annealing on Stability of Low Interface Recombination Velocity at TiO$_2$/p-Silicon Interface
Janam Jhaveri
,
Sushobhan Avasthi
,
Gabriel Man
,
Ken A. Nagamatsu
,
William E. McClain
,
Jefferey Schwartz
,
Antoine Kahn
,
James C. Sturm
Mar 1, 2014
Cite
Type
Presentations
Date
March, 2014
Next
Stable low-recombination n-Si/TiO2 hole-blocking interface and its effect on silicon heterojunction photovoltaics
Previous
Growth Mechanism and Carrier Transport in Hole-Blocking TiO$_2$/Silicon Heterojunctions
Cite
×