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2014

S. Selvarajaa et al., “193nm immersion lithography for high-performance silicon photonic circuits”, Spie Advanced Lithography, vol. 9052. SPIE , United states, pp. 9052-14, 2014.

W. Xie, Fiers, M., Selvarajaa, S., Van Campenhout, J., Absil, P., and Van Thourhout, D., “High-Performance Photonic Crystal Nanocavities on 300 mm SOI Substrate Fabricated With 193nm Immersion Lithography,”, Journal of Lightwave Technology, vol. 32, no. 18, pp. 1457 - 1462 , 2014.

D. - X. Xu et al., “"Silicon Photonic Integration Platform-Have We Found the Sweet Spot?," Selected Topics in Quantum Electronic”, IEEE Journal of Selected Topics in Quantum Electronics, vol. 20, no. 4, pp. 1-17., 2014.

2012

W. Xie, Fiers, M., Selvarajaa, S., Van Campenhout, J., Absil, P., and Van Thourhout, D., “High-Q photonic crystal nanocavities on 300 mm SOI substrate fabricated by 193 nm immersion lithography”, in Proceedings of the 2012 Annual Symposium of the IEEE Photonics Society Benelux Chapter, Belgium, 2012, pp. 183-186.