This course provides training in the use of various device and material characterization techniques. Optical characterization: optical microscopy, thin film measurement, ellipsometry, and Raman spectroscopy; Electrical characterization: Noise in electrical measurements, Resistivity with 2- probe, 4- probe and van der Pauw technique, Hall mobility, DC I-V and High frequency C-V characterization; Mechanical characterization: Laser Doppler vibrometry, Scanning acoustic microscopy, Optical profilometry, and Micro UTM; Material characterization: Scanning electron microscopy, Atomic force microscopy, XRD, and Focused ion beam machining.
Courses
Course Code: NE 201 Course Credit: 2:1 Course Term: August
Course Code: NE 202 Course Credit: 0:1 Course Term: August
This course is designed to give training in device processing at the cleanroom facility. Four specific modules will be covered to realize four different devices i) p-n junction diode, ii) MOS capacitor iii) MEMS Cantilever iv) Microfluidic channel..
Course Code: NE 203 Course Credit: 3:0 Course Term: August
This is a graduate-level course for students who are interested in micro and nano fabrication technology and process. The main object of the course is to introduce technology and processes that are used in fabricating advanced microelectronic devices and circuits. The primary focus is on the unit process technology.
Course Code: NE 310 Course Credit: 3:0 Course Term: January
This is a graduate-level course for students who are interested in the material and device aspect of photonics, particularly, integrated optics. The main object of the course is to understand the theory, design, and fabrication aspect of photonic devices and circuits from an application perspective.
Course Code: SiPh hands-on Course Credit: NA Course Term:
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Full registration cost for Industry professions/University faculty = 25,000.00+18% GST
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Startups = 17,500.00+18% GST
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Univerity students = 12,500.00+ 18% GST
The registration cost includes training material and catering.
Date/Day |
Events |
Monday 5th February |
Session 1 |
Inauguration and introduction to the course |
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Silicon Photonic Integrated Circuit basics |
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Photonic Integrated circuits design ecosystem |
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Lunch Break |
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Session 2 |
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Introduction to Ansys Photonics Design and Simulation software |
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Ansys Lumerical Photonics Desing and Simulation software: Introduction |
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Hands-on tool interface |
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Tuesday 6th February |
Session 3 |
Waveguide basics and directional coupler |
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Hands-on: Waveguide and directional coupler design |
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Lunch Break |
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Session 4 |
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Wavelength filter basics, Ring resonator and interferometer |
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Hands-on: Ring resonator and interferometer design and optimisation |
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Dinner and discussion session |
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Wednesday 7th February |
Session 5 |
Light-chip coupler: Edge and Grating coupler |
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Silicon modulator |
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Lunch Break |
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Session 6 |
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Application example: Sensing |
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Application examples: Transceiver |
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Thursday 8th February |
Session 7 |
Fabrication process overview |
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Visit to Nanofabrication facility/ project design challenge |
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Lunch Break |
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Session 8 |
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Photonic IC characterisation: visit and demo in Photonics research Lab |
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Valedictory Function / Feedback |