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Filters: Author is S. Selvarajaa [Clear All Filters]

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S. Selvarajaa, Bogaerts, W., and Van Thourhout, D., “Loss reduction in silicon nanophotonic waveguide micro-bends through etch profile improvement”, Optics Communications, vol. 284, pp. 2141-2144, 2011.

S. Selvarajaa, Bogaerts, W., Van Thourhout, D., and Schaekers, M., “Thermal trimming and tuning of hydrogenated amorphous silicon nano-photonic devices”, Applied Physics Letters, vol. 97, p. 7, 2010.

S. Selvarajaa, Bogaerts, W., Dumon, P., Van Thourhout, D., and Baets, R., “Sub-nanometer linewidth uniformity in silicon nano-photonic waveguide devices using CMOS fabrication technology”, IEEE Journal on Selected Topics in Quantum Electronics, vol. 16, pp. 316-324, 2010.

S. Selvarajaa, Jaenen, P., Bogaerts, W., Dumon, P., Van Thourhout, D., and Baets, R., “Fabrication of Photonic Wire and Crystal Circuits in Silicon-on-Insulator Using 193nm Optical Lithography”, IEEE Journal of Lightwave Technology, vol. 27, pp. 4076-4083, 2010.

S. Selvarajaa, Jaenen, P., Bogaerts, W., Dumon, P., Van Thourhout, D., and Baets, R., “Fabrication of Photonic Wire and Crystal Circuits in Silicon-on-Insulator Using 193nm Optical Lithography”, IEEE Journal of Lightwave Technology, vol. 27, pp. 4076-4083, 2009.

S. Selvarajaa et al., “Low-Loss Amorphous Silicon-On-Insulator Technology for Photonic Integrated Circuitry”, Optics Communications, vol. 282, pp. 1767-1770, 2009.

S. Selvarajaa, Sleeckx, E., Schaekers, M., and Bogaerts, W., “Deposited amorphous silicon-on-insulator technology for nano-photonic integrated circuits”, Optics Communications, vol. 313, pp. 210-216, 2014.

S. Selvarajaa et al., “193nm immersion lithography for high-performance silicon photonic circuits”, Spie Advanced Lithography, vol. 9052. SPIE , United states, pp. 9052-14, 2014.

S. Selvarajaa et al., “Si photonic device uniformity improvement using wafer-scale location specific processing”, IEEE Photonics Conference, pp. 725-726, 2012.

S. Selvarajaa et al., “Advanced 300-mm Waferscale Patterning for Silicon Photonics Devices with Record Low Loss and Phase Errors”, in 17th OptoElectronics and Communications Conference (OECC 2012), 2012.

S. Selvarajaa, L. Rosseel, F. E., Tabat, M., Bogaerts, W., Hautala, J., and Absil, P., “SOI thickness uniformity improvement using wafer-scale corrective etching for silicon nano-photonic device”, in 16th Annual Symposium of the IEEE Photonics Benelux Chapter, Belgium, 2011, pp. 289-292.

S. Selvarajaa, L. Rosseel, F. E., Tabat, M., Bogaerts, W., Hautala, J., and Absil, P., “SOI Thickness Uniformity Improvement using Corrective Etching for Silicon Nano-Photonic Device”, in 8th International Conference on Group IV Photonics, United Kingdom, 2011, pp. 71-73.

S. Selvarajaa, Bogaerts, W., Absil, P., Van Thourhout, D., and Baets, R., “Record Low-Loss Hybrid Rib/Wire Waveguides for Silicon Photonic Circuits”, in Group IV Photonics, China, 2010.

S. Selvarajaa, Dumon, P., Bogaerts, W., Van Thourhout, D., and Baets, R., “Amorphous silicon: Material for Photonic-Photonic and Electronic-Photonic Integration”, in 14th Annual Symposium of the IEEE Photonics Benelux Chapter, Belgium, 2009, pp. 137-140.

S. Selvarajaa, De Vos, K., Bogaerts, W., Bienstman, P., Van Thourhout, D., and Baets, R., “Effect of Device Density on the Uniformity of Silicon Nano-Photonic Waveguide Devices”, in The 22nd Annual Meeting of the IEEE Photonics Society, Turkey, 2009, pp. 311-312.

S. Selvarajaa et al., “Highly Efficient Grating Coupler between Optical Fiber and Silicon Photonic Circuit”, in Conference on Lasers and Electro-Optics (CLEO) 2009, United States, 2009.

S. Selvarajaa, Van Thourhout, D., and Baets, R., “Amorphous silicon: For Advanced Photonic Integrated Circuits”, in 10h FirW PhD Symposium, Belgium, 2009.

S. Selvarajaa, Bogaerts, W., Dumon, P., Van Thourhout, D., and Baets, R., “Amorphous silicon photonic crystals made with 193nm lithography”, in The 8th International Photonic $&$ Electromagnetic Crystal Structures Meeting (PECS), Australia, 2009.

S. Selvarajaa, Van Thourhout, D., and Baets, R., “Integration of silicon photonic circuit and CMOS circuit”, in CMOS Photonics 5th Optoelectronic and Photonic Winter School, Italy, (2009) , Italy, 2009.

S. Selvarajaa et al., “Demonstration Of Optical Via And Low-Loss Optical Crossing For Vertical Integration Of Silicon Photonic Circuit”, in PHOTONICS 2008:The International Conference on Fiber Optics and Photonics, 2008.

S. Selvarajaa, Bogaerts, W., Van Thourhout, D., and Baets, R., “Fabrication of Uniform Photonic Devices Using 193nm Optical Lithography in Silicon-on-Insulator”, in 14th European Conference on Integrated Optics (ECIO), Netherlands, 2008.

S. Selvarajaa, Van Thourhout, D., and Baets, R., “Fabrication of photonic integrated circuits using high resolution CMOS fabrication process”, in ePIXnet Springshool 2008, Italy, 2008.

S. Selvarajaa, Van Thourhout, D., Baets, R., Sleeckx, E., and Schaekers, M., “Deposited silicon-on-insulator material technology for photonic integrated circuitry”, in 12th IEEE/LEOS Benelux Annual Symposium 2007, Belgium, 2007, pp. 15-18.

S. Selvarajaa et al., “Silicon nanophotonic wire structures fabricated by 193nm optical lithography”, in LEOS Annual Meeting, United States, 2007.

S. Selvarajaa, Baets, R., and Van Thourhout, D., “Nanophotonic integrated chip fabricated by CMOS technology”, in 8th FirW PhD Symposium, Belgium, 2007.

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