Publications

Found 154 results
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2014
S. Selvarajaa et al., 193nm immersion lithography for high-performance silicon photonic circuits, Spie Advanced Lithography, vol. 9052. SPIE , United states, pp. 9052-14, 2014.
S. Selvarajaa et al., 193nm immersion lithography for high-performance silicon photonic circuits, Spie Advanced Lithography, vol. 9052. SPIE , United states, pp. 9052-14, 2014.
P. P. Absil et al., Advances in silicon photonics WDM devices, in Proc. SPIE 9010 , Next-Generation Optical Networks for Data Centers and Short-Reach Links, 2014.
P. P. Absil et al., Advances in silicon photonics WDM devices, in Proc. SPIE 9010 , Next-Generation Optical Networks for Data Centers and Short-Reach Links, 2014.
P. P. Absil et al., Advances in silicon photonics WDM devices, in Proc. SPIE 9010 , Next-Generation Optical Networks for Data Centers and Short-Reach Links, 2014.
S. K. Selvaraja et al., Highly uniform and low-loss passive silicon photonics devices using a 300mm CMOS platform, in Optical Fiber Communication Conference, 2014.
S. K. Selvaraja et al., Highly uniform and low-loss passive silicon photonics devices using a 300mm CMOS platform, in Optical Fiber Communication Conference, 2014.
W. Xie, Fiers, M., Selvarajaa, S., Van Campenhout, J., Absil, P., and Van Thourhout, D., High-Performance Photonic Crystal Nanocavities on 300 mm SOI Substrate Fabricated With 193nm Immersion Lithography,, Journal of Lightwave Technology, vol. 32, no. 18, pp. 1457 - 1462 , 2014.
W. Xie, Fiers, M., Selvarajaa, S., Van Campenhout, J., Absil, P., and Van Thourhout, D., High-Performance Photonic Crystal Nanocavities on 300 mm SOI Substrate Fabricated With 193nm Immersion Lithography,, Journal of Lightwave Technology, vol. 32, no. 18, pp. 1457 - 1462 , 2014.
A. Khanna et al., Impact of ALD grown passivation layers on silicon nitride based integrated optics devices for very-near-infrared wavelengths, Optics Express, 2014.
A. Khanna et al., Impact of ALD grown passivation layers on silicon nitride based integrated optics devices for very-near-infrared wavelengths, Optics Express, 2014.
A. Z. Subramanian et al., Low-Loss Singlemode PECVD Silicon Nitride Photonic Wire Waveguides for 532-900 nm Wavelength Window Fabricated Within a CMOS Pilot Line, IEEE Photonics Journal, vol. 5, p. 2202809,2202809, 2014.
P. R. Prasad, Selvaraja, S. K., and Varma, M., Sensitivity analysis of tunable double microring resonator based intensity sensor, IEEE 2nd International Conference on Emerging Electronics (ICEE). IEEE, Bangalore, India, 2014.
D. - X. Xu et al., "Silicon Photonic Integration Platform-Have We Found the Sweet Spot?," Selected Topics in Quantum Electronic, IEEE Journal of Selected Topics in Quantum Electronics, vol. 20, no. 4, pp. 1-17., 2014.
2012
S. Selvarajaa et al., Advanced 300-mm Waferscale Patterning for Silicon Photonics Devices with Record Low Loss and Phase Errors, in 17th OptoElectronics and Communications Conference (OECC 2012), 2012.
S. Selvarajaa et al., Advanced 300-mm Waferscale Patterning for Silicon Photonics Devices with Record Low Loss and Phase Errors, in 17th OptoElectronics and Communications Conference (OECC 2012), 2012.
S. Selvarajaa et al., Advanced 300-mm Waferscale Patterning for Silicon Photonics Devices with Record Low Loss and Phase Errors, in 17th OptoElectronics and Communications Conference (OECC 2012), 2012.
et al., Co-integration of Ge detectors and Si modulators in an advanced Si photonics platform, in Proc. SPIE 8431, Silicon Photonics and Photonic Integrated Circuits III, 843114, 2012.

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