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High-Performance Photonic Crystal Nanocavities on 300 mm SOI Substrate Fabricated With 193nm Immersion Lithography,

W. Xie, Fiers, M., Selvarajaa, S., Van Campenhout, J., Absil, P., and Van Thourhout, D., “High-Performance Photonic Crystal Nanocavities on 300 mm SOI Substrate Fabricated With 193nm Immersion Lithography,”, Journal of Lightwave Technology, vol. 32, no. 18, pp. 1457 - 1462 , 2014.