Publications
“193nm immersion lithography for high-performance silicon photonic circuits”, Spie Advanced Lithography, vol. 9052. SPIE , United states, pp. 9052-14, 2014.
, “High-Performance Photonic Crystal Nanocavities on 300 mm SOI Substrate Fabricated With 193nm Immersion Lithography,”, Journal of Lightwave Technology, vol. 32, no. 18, pp. 1457 - 1462 , 2014.
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