Publications

Found 18 results
Author Type [ Year(Asc)]
Filters: Author is Joris Van Campenhout  [Clear All Filters]
2014
S. Selvarajaa et al., “193nm immersion lithography for high-performance silicon photonic circuits”, Spie Advanced Lithography, vol. 9052. SPIE , United states, pp. 9052-14, 2014.
P. P. Absil et al., “Advances in silicon photonics WDM devices”, in Proc. SPIE 9010 , Next-Generation Optical Networks for Data Centers and Short-Reach Links, 2014.
S. K. Selvaraja et al., “Highly uniform and low-loss passive silicon photonics devices using a 300mm CMOS platform”, in Optical Fiber Communication Conference, 2014.
W. Xie, Fiers, M., Selvarajaa, S., Van Campenhout, J., Absil, P., and Van Thourhout, D., “High-Performance Photonic Crystal Nanocavities on 300 mm SOI Substrate Fabricated With 193nm Immersion Lithography,”, Journal of Lightwave Technology, vol. 32, no. 18, pp. 1457 - 1462 , 2014.
2013
D. Korn et al., “Silicon-organic hybrid (SOH) IQ modulator using the linear elctro-optic effect for transmitting 16QAM at 112 Gbit/s”, Optics Express, vol. 21, pp. 13219-13227, 2013.
2012
S. Selvarajaa et al., “Advanced 300-mm Waferscale Patterning for Silicon Photonics Devices with Record Low Loss and Phase Errors”, in 17th OptoElectronics and Communications Conference (OECC 2012), 2012.
et al., “Co-integration of Ge detectors and Si modulators in an advanced Si photonics platform”, in Proc. SPIE 8431, Silicon Photonics and Photonic Integrated Circuits III, 843114, 2012.
W. Xie, Fiers, M., Selvarajaa, S., Van Campenhout, J., Absil, P., and Van Thourhout, D., “High-Q photonic crystal nanocavities on 300 mm SOI substrate fabricated by 193 nm immersion lithography”, in Proceedings of the 2012 Annual Symposium of the IEEE Photonics Society Benelux Chapter, Belgium, 2012, pp. 183-186.
J. Van Campenhout et al., “Low-Voltage, Low-Loss, Multi-Gb/s Silicon Micro-Ring Modulator based on a MOS Capacitor”, in OFC 2012, United States, 2012.
J. Van Campenhout et al., “Low-Voltage, Low-Loss, Multi-Gb/s Silicon Micro-Ring Modulator based on a MOS Capacitor”, in Optical Fiber Communication Conference and Exposition (OFC), United States, 2012.
S. Selvarajaa et al., “Si photonic device uniformity improvement using wafer-scale location specific processing”, IEEE Photonics Conference, pp. 725-726, 2012.
P. Absil et al., “Silicon Photonics, a key technology enabler for short reach optical interconnects”, in MRS Spring Meeting, California, United States, 2012.
2011
W. Bogaerts et al., “Optical Interconnect Technologies based on Silicon Photonics”, in MRS Spring 2011, 2011.
P. Absil et al., “A Robust Technology Platform for High Density Silicon-Based Photonics Integration”, in The 1st International Symposium on Photonics and Electronics Convergence-Advanced Nanophotonics and Silicon Device Systems, Tokyo, Japan, 2011.
W. Bogaerts et al., “A Silicon Photonics Platform with Heterogeneous III-V Integration”, in Integrated Photonics Research Silicon and Nano-Photonics (IPR), Canada,, 2011.
2008
G. Roelkens et al., “Silicon nanophotonics: towards VLSI photonic integrated circuits”, in URSI, United States, 2008.
2007
D. Van Thourhout et al., “Silicon nanophotonics on CMOS”, in 33rd International Conference on Micro- and Nano-Engineering 2007 (MNE07), Denmark, 2007, pp. 113-114.
2006
R. Baets et al., “Silicon-on-insulator based nanophotonics: why, how, what for?”, in 1st International Optence Workshop on Silicon Photonics, Germany, 2006.