In a collaborative study with Prof. Akshay Singh’s group in Department of Physics at the Indian Institute of Science (IISc), we have demonstrated significant enhancement in optical signals from 2D materials using engineered substrates.
Using grayscale electron-beam lithography (g-EBL), the team fabricated substrates with precisely tuned trench depths. When monolayer MoS₂ was transferred onto these structures, a remarkable >2 orders of magnitude enhancement in both Raman and photoluminescence (PL) intensities was observed, compared to conventional flat substrates.
This work opens up new avenues in tailoring light-matter interaction in 2D materials through substrate engineering, with applications in nanophotonics, optoelectronics, and 2D material-based sensors.
Title: Enhancement of Raman and Photoluminescence Intensity of Monolayer MoS₂ Using Engineered Substrates via Grayscale Electron-Beam Lithography
Journal: ACS Applied Nano Materials
Authors: Manavendra Pratap Singh, Ranju Dalal, Akshay Singh, Akshay Naik
Read the paper here