new developments

Revolutionizing Microscopic Sample Preparation with the Quorum K850 Critical Point Dryer

The Quorum tech K850 Critical Point Dryer (CPD) from the UK. This CPD efficiently removes moisture from materials for microscopic applications using carbon dioxide (CO2) purging. This equipment is invaluable for sample preparation in various fields, including Biological and MEMS. The critical point dryer (CPD) model K850 manufactured by Quorum tech, United Kingdom (UK) has been installed in MNCF which is employed to remove moisture by purging carbon dioxide (CO2) in a material for microscopic applications. More specifically, the principle of the continuity of state for which there is no apparent difference between the liquid and gas state of a medium, the surface tension between this interface reducing to zero. This occurs at a specific temperature and pressure with resulting density and is known as the critical point. The K850 is fitted with electric heating and adiabatic cooling, and temperature control of +35°C on heating with associated pressure on heating of the order of 1250psi. This ensures the critical point is accurately obtained, avoiding excess pressures or temperatures, or the need to rely on pressure relief valves to control pressure during the heating cycle. It has important applications in sample preparation of Biological, MEMS and other areas. Along with the setup an additional filter assembly consisting of a pair of 250μm and 0.5 μm filter has been attached to avoid contamination if any from the CO2 cylinder.

MFP-3D Origin+: State-of-the-art Atomic force microscope

Additional to standard measurements, the MFP-3D Origin+ by Asylum Research (Oxford instruments) offers cutting-edge capabilities such as dual AC resonance tracking (DART) for precise piezo force microscopy with high-frequency tracking. In the month of October 2022, successful installation of yet another state-of-the art Atomic Force Microscope at our facility in MNCF, CeNSE took place. The mechanical bay is now equipped with MFP-3D Origin+ Asylum Research by Oxford Instruments. It has a capability of DART (Dual AC Resonance tracking) which assists in precise piezo force microscopic measurements with higher precision of resonant frequency change tracking. DART mode has the provision of measurements at high voltage up to 220V. In addition to above modes, the system has capabilities of other special modes like Conductive AFM (ORCA mode), AFM at high temperatures and AFM in fluid, Bimodal Dual AC mode in air and fluid. Other conventional measurements like tapping & Contact mode (in air and fluid) , KPFM, MFM, LFM, EFM, Single frequency PFM, AM-FM and Lithography modes are also efficiently done.

Harnessing Fourier Transform Spectroscopy for Enhanced Spectral Response Analysis

The measurement of the spectral response of a detector using a monochromator followed by an integrating sphere is not very efficient for high wavelengths. Hence an alternative approach using an FTIR spectrometer provides better accuracies. Various high performance IR detectors are today available on the market which exhibit various spectral features. The spectral response of a detector is usually measured by means of a monochromator followed by an integrating sphere and compared to a calibrated reference detector. This approach is usually very efficient in the visible range but as the wavelength increases, it becomes less efficient. An alternative approach may therefore be considered, using a Fourier transform IR spectrometer, based on the fact that the FTIR continuous scan interfergram contains the different spectral frequencies of interest.

With the FTIR spectrometer housed at optical bay, MNCF, we have successfully demonstrated the photoconductivity measurements using a programmed baseplate and a detector of known spectral response. The configurations in the present software ‘spectrum’ were modified to record the output from an external detector installed in the IR beam path. Initially the background spectrum was recorded using a calibrated detector and later the calibrated detector was replaced by the detector under study to perform the photoconductivity measurements.

Cutting-Edge Ion Etch Systems Revolutionize Deep Etching Processes

A deep reactive ion etch was procured from oxford instruments to achieve deep etches in the fabrication of MEMS systems. This system uses both the Bosch and cryogenic processes to enable high etch rates, selectivity, anisotropy and to smooth sidewalls and tapered profiles. Another reactive ion etch was procured from CORIAL at NNfC, CeNSE. This system uses a type of plasma etch technology with a key feature being its directional (usually anisotropic) etching capability.