| Title | BCl3/Cl2-Based Inductively Coupled Plasma Etching of GaN/AlGaN Using Photoresist Mask |
| Publication Type | Journal Article |
| Year of Publication | 2012 |
| Authors | Rawal, DS, Malik, HK, Agarwal, VR, Kapoor, AKumar, Sehgal, BK, Muralidharan, R |
| Journal | IEEE Transactions on Plasma Science |
| Volume | 40 |
| Pagination | 2211 |
