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BCl3/Cl2-Based Inductively Coupled Plasma Etching of GaN/AlGaN Using Photoresist Mask

TitleBCl3/Cl2-Based Inductively Coupled Plasma Etching of GaN/AlGaN Using Photoresist Mask
Publication TypeJournal Article
Year of Publication2012
AuthorsRawal, DS, Malik, HK, Agarwal, VR, Kapoor, AKumar, Sehgal, BK, Muralidharan, R
JournalIEEE Transactions on Plasma Science
Volume40
Pagination2211