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The centre offers MTech and PhD degree programs in the area of nano science and engineering.

M. Tech. Degree:

Clean room 1 (2)

Starting from 2014, CeNSE has initiated an MTech degree program in Nano Science and Engineering. The list of qualifications for admission into the MTech program is given below. Successful completion of the MTech program requires the completion of 64 credits which includes 36 credits for course work and 28 credits for the project. The course work prepares the students by providing training in interdisciplinary areas such as Solid state physics, Nanomaterials, Nanoelectronics, MEMS and NEMS, Nanophotonics, Biosensors, Micro/Nano fluidics, with hands-on experiments on Nanofabrication and Nano Characterization techniques. The project constitutes a substantial portion of the MTech program and excellent performance in the project is absolutely essential to achieve a good academic record in the program as well as to secure a promising career in industry or academia. In addition, the MTech program is also unique in its emphasis of entrepreneurship and social impact of technology in its curriculum.

Duration: Two years

Eligibility: BE / B Tech or equivalent degree in any discipline with GATE paper in AE, BT, CH, EE, EC, IN, ME, MT, PH, XE OR M Sc or equivalent degree in Electronics, Physics, Chemistry with GATE paper in CY, EC, IN, PH.

Approximately 20 students will be admitted each year. The candidates will be shortlisted based on GATE ranking and will be called for an interview. Students appearing for the interview are expected to have a good grasp of the fundamentals in their respective subjects. In addition, they must also have strong mathematical background and be conversant with topics such as ordinary differential equations. The interview process tests the subject knowledge as well as the aptitude and interest to pursue interdisciplinary course work in nano science and engineering. The final selection will be made based on the performance at the interview.

Ph. D. Degree:

Clean room 1 (4)

The Centre offers admission to the Ph. D. degree program of the Institute under two streams, as described below. These programs involve rigorous course work followed by thesis research in various fields, including nanomaterials and nanostructures, electronics, nanofluidics, nanophotonics, nanobiotechnology, plasmonics, sensor systems, computational modeling etc.

Duration: Variable (typically four to six years) although there have been exceptional instances where PhD thesis have been successfully defended under 2.5 years

Direct Admission (denoted as NE stream)

The NE stream provides direct admission to the Ph.D. program of the Centre run by its faculty. Research Areas: Nanomaterials and Nanostructures, Nanoelectronic Devices,Nanoscale motion, Nano-Biophotonics,Nanophotonics, Plasmonics,Sensor Systems and Computational Nanoengineering.


Interdisciplinary Program (denoted as NA stream)

The second stream is an interdisciplinary program conducted by the Centre in conjunction with several other departments across the Institute. A student admitted under this program has two advisors from two different departments. The admission into this program is offered against a specified research project proposed by the two advisors. A list of all available projects is made available to admission seekers before the interview.

Research Areas: Broadly, all areas of nano science and engineering.

Eligibility for the PhD programs:

  • M.E./M.Tech. or equivalent in any discipline.
  • B.E. / B.Tech. or equivalent in any Engineering discipline with a valid score in a recommeded GATE paper (See list of papers for M.Tech)
  • M.Sc. or equivalent in any Science discipline with a valid score in a recommended GATE paper (See list of papers for M.Tech)
  • Qualification in one of the following national exams: INSPIRE, Joint CSIR UGC NET for JRF, DBT JRF, UGC NET for JRF and JEST.

M Tech program: Admission to the M Tech program is offered only for the July session.

Ph. D program: Admissions to the PhD program is typically done for the July session. However, a limited number of topic/field specific admissions may be made for the January session as well. 

The admission process starts with filing the online applications at the IISc admissions website. Candidates are shortlisted for interview based on either the scores in one of the national exams or qualification. The detailed eligibility criteria can be found here. The background of students admitted to CeNSE in the past have been mostly from ECE, Physics, Mechanical, Materials disciplines, although there are students pursuing PhD/ MTech at CeNSe whose undergraduate degrees are in areas as diverse as biotechnology or biomedical instrumentation. Shortlisted candidates have to appear for an interview at CeNSE for selection. The interview typically consists of two to three sections, namely math and analytical questions such as plotting functions, basic calculus, differential equations etc, questions related to courses taken during their UG and PG degrees, and questions probing their research aptitude. Admission is based primarily on the performance in the interview and the results are generally announced 2-3 weeks after the interview.

Post Admission M Tech

lab 2M Tech students typically spend most of their first year in taking courses. The course structure consists of a combination of core courses offered at CeNSE, and electives which the student may take from any department at IISc. Towards the end of the first semester, the students need to choose an M Tech thesis project which is an indispensible part of the successful completion of the M Tech program. Work related to the thesis starts during the 2nd semester and should result in a well documented report culminating in the award of the M Tech degree.

Post Admission Ph. D

The most important activity after joining the Ph. D program is the selection of your research advisor. At CeNSE we give absolute freedom to choose a research advisor based on the mutual interest of the student and the faculty member. In order to make a well thought out choice of research advisor, you are encouraged to talk to the faculty members whose work interest you and spend some time in their labs and attend the group meetings to get a good idea of what research in the group involves. At CeNSE, students also have the option of selection into the DeITY Vishweswaraiah fellowship program which offers a higher PhD scholarship amount compared to the regular scholarship. Selection to this fellowship program is based on the choice of the research topic and will be decided within the first few weeks after the academic session begins.

Students typically take between 4-8 courses depending on the prior preparation to gain a solid background in their topic of research. They should maintain a minimum CGPA of 5.5 throughout the course program. A major step towards the completion of a successful PhD is to pass the comprehensive exam which is held before completing two years in the PhD program. The comprehensive exam is evaluated by a committee of examiners from inside and outside the department. The committee evaluates if sufficient progress has been made towards the research goal. The exam also tests your grasp of the material discussed in your course work. After successfully passing the comprehensive exams, students focus on the research problem intensively leading to the successful defense of the PhD thesis typically within 5 years of joining the program.

January - April
NE 200 January - April Technical Writing and Presentation

This course is designed to help students learn to write their manuscripts,technical reports, and dissertations in a competent manner. The do's and dont's of the English language will be dealt with as a part of the course. Assignments will include writing on topics to a student's research interest, so that the course may benefit each students directly.

Instructor: S.A. Shivashankar

NE 201 January - April Micro and Nano Characterization Methods

This course provides training in the use of various device and material characterization techniques. Optical characterization: optical microscopy, thin film measurement, ellipsometry and Raman spectroscopy; Electrical characterization: Noise in electrical measurements, Resistivity with 2- probe, 4-probe and van der Pauw technique, Hall mobility, DC I-V and High frequency C-V characterization; Mechanical characterization: Laser Doppler vibrometry, Scanning acoustic microscopy, Optical profilometry, and Micro UTM; Material characterization: Scanning electron microscopy, Atomic force microscopy, XRD, and Focused ion beam machining.

Instructors: Akshay Naik and Manoj Varma

NE 202 January - April Micro and Nano Fabrication

This course is designed to give training in device processing at the cleanroom facility. Four specific modules will be covered to realize four different devices i) p-n junction diode, ii) MOS capacitor iii) MEMS Cantilever iv) Microfluidic channel.

Instructors : Shankar Kumar Selvaraja and Sushobhan Avasthi

NE 211 January - April Micro/Nano Mechanics

This is a foundation level course in mechanics which will prepare students to pursue advanced studies related to mechanical phenomena at the micro and nano scales. Basics of continuum theory, continuum hypothesis, elasticity, thermoelasticity, fluid mechanics, heat conduction, electromagnetism, coupled thermal-elastic and electrostatic-elastic systems, MEMS and NEMS structures -- beams, plates, and membranes, scaling of mechanical properties and continuum limits, numerical methods for mechanical modelling, mechanics beyond continuum theory.

Instructors: Rudra Pratap, Akshay Naik and Prosenjit Sen

NE 221 January - April Advanced MEMS Packaging

This course intends to prepare students to pursue advanced topics in more specialized areas of MEMS and Electronic packaging for various real time applications such as Aero space, Bio-medical, Automotive, commercial, RF and micro fluidics etc. MEMS – An Overview, Miniaturisation, MEMS and Microelectronics -3 levels of Packaging. Critical Issues viz., Interface, Testing & evaluation. Packaging Technologies like Wafer dicing, Bonding and Sealing. Design aspects and Process Flow, Materials for Packaging, Top down System Approach. Different types of Sealing Technologies like brazing, Electron Beam welding and Laser welding. Vacuum Packaging with Moisture Control. 3D Packaging examples. Bio Chips / Lab-on-a chip and micro fluidics, Various RF Packaging, Optical Packaging, Packaging for Aerospace applications. Advanced and Special Packaging techniques – Monolithic, Hybrid etc., Transduction and Special packaging requirements for Absolute, Gauge and differential Pressure measurements,Temperature measurements, Accelerometer and Gyro packaging techniques, Environmental Protection and safety aspects in MEMS Packaging. Reliability Analysis and FMECA. Media Compatibility Case Studies, Challenges/Opportunities/Research frontier.

Instructors:  Prosenjit Sen and M.M. Nayak

NE 310 January - April Photonics technology: Materials and Devices

Optics fundamentals; ray optics, electromagnetic optics and guided wave optics, Light-matter interaction, optical materials; phases, bands and bonds, waveguides, wavelength selective filters, electrons and photons in semiconductors, photons in dielectric, Light-emitting diodes, optical amplifiers and Lasers, non-linear optics, Modulators, Film growth and deposition, defects and strain, III-V semiconductor device technology and processing, silicon photonics technology, photonic integrated circuit in telecommunication and sensors.

Instructor:  Shankar Kumar Selvaraja

NE 313 January - April Lasers: Principles and Systems

This is an intermediate level optics course which builds on the background provided in “Introduction to photonics” offered in our department. Owing to the extensive use of lasers in various fields, we believe a good understanding of these principles is essential for students in all science and engineering disciplines.

Instructor: V R Supradeepa

NE 327 January - April Nanoelectronics Device Technology

The course is intended to review basic semiconductor device physics and provide a broad survey of modern device technology, in addition to an introduction to nanomaterials and their special features. Overview of Nanoelectronics devices and materials requirement, Review of basic device physics, MOS capacitor as a building block of FET, High-k dielectrics, CMOS scaling, Non idealities in MOS structure, metal gate electrodes and work function engineering, Nano MOSFET performance metrics, non-classical transistor structure; Transport in Nano MOSFET, ballistic transport, Silicon On Insulator (SOI), Multigate FET, metal-semiconductor source/drain junctions, Germanium Nano MOSFETs, Effect of strain and quantization on transistor performance, Compound semiconductor MESFETs and MOSFETs, Heterostructure MOSFETs, Electrical characterization: HFCV and LFCV, I-V and reliability measurements, Parameter extraction; Introduction to Nanomaterials (with elements of quantum mechanics).

Instructors: Navakanta Bhat and K.N.Bhat and S A Shivashankar

NE 332 January - April Physics and Mathematics of Molecular Sensing

This course presents a systematic view of the process of sensing molecules with emphasis on bio-sensing using solid state sensors. Molecules that need to be sensed, relevant molecular biology, current technologies for molecular sensing, modeling adsorption-desorption processes, transport of target molecules, noise in molecular recognition, proof-reading schemes, multi-channel sensing, comparison between in-vivo sensing circuits and solid state biosensors.

Instructor: Manoj Varma

August - December
NE 101 August - December Entrepreneurship, Ethics and Societal Impact

This course is intended to give an exposure to issues involved in translating the technologies from lab to the field. Various steps and issues involved in productization and business development will be clarified, drawing from experiences of successful entrepreneurs in high technology areas. The intricate relationship between technology, society and ethics will also be addressed with illustrations from people involved in working with the grass root levels of the society.

Instructor: Navakanta Bhat

NE 201 August - December Micro and Nano Characterization Methods

This course provides training in the use of various device and material characterization techniques. Optical characterization: optical microscopy, thin film measurement, ellipsometry and Raman spectroscopy; Electrical characterization: Noise in electrical measurements, Resistivity with 2- probe, 4-probe and van der Pauw technique, Hall mobility, DC I-V and High frequency C-V characterization; Mechanical characterization: Laser Doppler vibrometry, Scanning acoustic microscopy, Optical profilometry, and Micro UTM; Material characterization: Scanning electron microscopy, Atomic force microscopy, XRD, and Focused ion beam machining.

Instructors:  Akshay Naik and Manoj Varma.

NE 202 August - December Micro and Nano Fabrication

This course is designed to give training in device processing at the cleanroom facility. Four specific modules will be covered to realize four different devices :

  1. p-n junction diode
  2.  MOS capacitor
  3. MEMS Cantilever
  4. Microfluidic channel.

Instructors: Shankar Kumar Selvaraja and Sushobhan Avasthi

NE 203 August - December Advanced micro- and nanofabrication technology and process

Introduction and overview of micro and nano fabrication technology. Safety and contamination issues in a cleanroom. Overview of cleanroom hazards. Basic process flow structuring. Wafer type selection and cleaning methods. Additive fabrication processes. Material deposition methods. Overview of physical vapour deposition methods (thermal, e-beam, molecular beam evaporation) and chemical vapour deposition methods (PE-CVD, MOCVD, CBE, ALD). Pulsed laser deposition (PLD), pulsed electron deposition (PED). Doping: diffusion and ion implant techniques. Optical lithography fundamentals, contact lithography, stepper/canner lithography, holographic lithography, direct-laser writing. Lithography enhancement methods and lithography modelling. Non-optical lithography; E-beam lithography, ion beam patterning, bottom-up patterning techniques. Etching process: dry and wet. Wet etch fundamentals, isotropic, directional and anisotropic processes. Dry etching process fundamentals, plasma assisted etch process, Deep Reactive Ion Etching (DRIE), Through Silicon Vias (TSV). Isotropic release etch. Chemical-mechanical polishing (CMP), lapping and polishing. Packaging and assembly, protective encapsulating materials and their deposition. Wafer dicing, scribing and cleaving. Mechanical scribing and laser scribing, Wafer bonding, die-bonding. Wire bonding, die-bonding. Chip-mounting techniques.

Instructors: Shankar Kumar Selvaraja and Sushobhan Avasthi

NE 205 August - December Semiconductor Devices and Integrated Circuit Technology

This is a foundation level course in the area of electronic device technology. Band structure and carrier statistics, Intrinsic and extrinsic semiconductor, Carrier transport, p-n junction, Metal-semiconductor junction, Bipolar Junction Transistor, Heterojunction, MOS capacitor, Capacitance-Voltage characteristics, MOSFET, JEFET, Current-Voltage characteristics, Light Emitting Diode, Photodiode, Photovoltaics, Charge Coupled Device Integrated circuit processing, Oxidation, Ion implantation, Annealing, Diffusion, Wet etching and dry plasma etching, Physical vapour deposition, Chemical vapour deposition, Atomic layer deposition, Photolithography, Electron beam lithography, Chemical mechanical polishing, Electroplating, CMOS process integration, Moore’s law, CMOS technology scaling, Short channel effects, Introduction to Technology CAD, Device and Process simulation and modeling.

Instructor: Digbijoy N. Nath

NE 213 August - December Introduction to Photonics

This is a foundation level optics course which intends to prepare students to pursue advanced topics in more specialized areas of optics such as biophotonics, nanophotonics, non-linear optics etc. Classical and quantum descriptions of light, diffraction, interference, polarization. Fourier optics, holography, imaging, anisotropic materials, optical modulation, waveguides and fiber optics, coherence and lasers, plasmonics.

Instructors: Manoj Varma and Ambarish Ghosh

NE 215 August - December Applied Solid State Physics

This course is intended to build a basic understanding of solid state science, on which much of modern device technology is built, and therefore includes elementary quantum mechanics. Review of Quantum Mechanics and solid state physics, Solution of Schrodinger equation for band structure, crystal potentials leading to crystal structure, reciprocal lattice, structure-property correlation, Crystal structures and defects, X-ray diffraction, lattice dynamics, Quantum mechanics and statistical mechanics, thermal properties, electrons in metals, semiconductors and insulators, magnetic properties, dielectric properties, confinement effects.

Instructors: Akshay Naik and S A Shiva Shankar

NE 222 August - December MEMS: Modeling, Design, and Implementation

This course discusses all aspects of MEMS technology – from modeling, design, fabrication, process integration, and final implementation. Modeling and design will cover blockset models of MEMS transducers, generally implemented in SIMULINK or MATLAB. Detailed multiphysics modeling may require COMSOL simulations. The course also covers MEMS specific micromachining concepts such as bulk micromachining, surface micromachining and related technologies, micromachining for high aspect ratio microstructures,glass and polymer micromachining, and wafer bonding technologies. Specific case studies covered include Pressure Sensors, Microphone, Accelerometers, Comb-drives for electrostatic actuation and sensing, and RF MEMS. Integration of micromachined mechanical devices with microelectronics circuits for complete implementation is also dicussed.

Instructors: Rudra Pratap and K.N. Bhat

NE 231 August - December Microfluidics

This is a foundation course discussing various phenomena related to fluids and fluid-interfaces at micro-nano scale. This is a pre-requisite for advanced courses and research work related to micro-nano fluidics.Transport in fluids, equations of change, flow at micro-scale, hydraulic circuit analysis, passive scalar transport, potential fluid flow, stokes flow Electrostatics and electrodynamics, electroosmosis,electrical double layer (EDL), zeta potential, species and charge transport, particle electrophoresis,AC electrokinetics Surface tension, hysteresis and elasticity of triple line, wetting and long range forces, hydrodynamics of interfaces, surfactants, special interfaces Suspensions, rheology,nanofluidics, thick-EDL systems, DNA transport and analysis.

Instructor: Prosenjit Sen

NE 241 August - December Material Synthesis: Quantum Dots To Bulk Crystals

All device fabrication is preceded by material synthesis which in turn determines material microstructure, properties and device performance. The aim of this course is to introduce the student to the principles that help control growth. Crystallography ; Surfaces and Interfaces; Thermodynamics, Kinetics, and Mechanisms of Nucleation and Growth of Crystals ; Applications to growth from solutions, melts and vapors (Chemical vapor deposition an Physical vapor deposition methods); Stress effects in film growth.

Instructor: Srinivasan Raghavan

NE 312 August - December Nonlinear and Ultrafast Photonics

This is an intermediate level optics course which builds on the background provided in “Introduction to photonics” offered in our department. Owing to the extensive use of nonlinear optical phenomena and Ultrafast lasers in various fields, we believe a good understanding of these principles is essential for students in all science and engineering disciplines, in particular students involved in the area of Photonics, RF and Microwave systems, Optical Instrumentation and Lightwave (Fiber-optic) Communications. In addition, this course intends to prepare students to pursue advanced topics in more specialized areas of optics such as Biomedical Imaging, Quantum optics, Intense field phenomena etc.

Instructor: V. R. Supradeepa

Course timings for the current semester (Jan - April) is as follows :

Sl. No Course code Topic Instructors Time Day Venue
1. NE 221    2:1

Advanced MEMS Packaging

Lab: Packaging Lab

Prosenjit Sen / MM Nayak

09.00 am to 10.00 am

2.00 pm to 5.30 pm

Tuesday Thursday

Tuesday Thursday



2. NE 332 3:0 Physics and Mathematics of Molecular Sensing Manoj Varma 10.00 am to 11.00 am Tuesday Thursday TF10, CeNSE


NE 200 2:0 Technical Writing in English S A Shivashankar 2.30 pm to 4.10 pm Wednesday Seminar Hall, CeNSE


NE 202 0:1 Device Fabrication Lab Module (Micro And Nano Fabrication) Shankar Kumar Selvaraja/ Sushobhan Avasti 2.00 pm to 5.00 pm Monday - Friday  


NE 201 2:1 Micro and Nano Characterization Methods Akshay Naik / Manoj Varma 12.00 noon to 1.00 pm   Monday Wednesday FF11, CeNSE


NE310 3:0 Photonics technology: Materials and Devices Shankar Kumar Selvaraja 11.00 am to 12.30 pm Tuesday Thursday FF11, CeNSE


NE313 3:0 Lasers: Principles and Systems V R Supradeepa 12.00 noon to 1.00 pm Monday Wednesday Friday TF10, CeNSE


NE314 3:0 Semiconductor Opto-electronics and Photovoltaics Digbijoy N. Nath / Sushobhan Avasthi 10.00 am to 11.00 am Monday Wednesday Friday FF11, CeNSE


NE211 3:0

Micro/Nano Mechanics

Cross listing: ME 237  (3:0) Mechanics of Microsystems

Prosenjit Sen / Akshay Naik 11.00 am to 12.00 Noon Monday Wednesday Friday FF11, CeNSE

Starting from 2013, the centre conducts a training program every summer, for promising Undergraduate and Masters students from India and abroad, selected through a rigorous and competitive process. The training is primarily based on the facilities available at CeNSE, and covers a variety of research topics under the broad umbrella of nano science and engineering. The training program will be of 8 -10 weeks duration. The scholarship paid to the eligible candidates would be Rs 5000/month.

How to apply:

Every January we put up online forms in this page for applying to the summer program. Post selection, the list of selected candidates is displayed here.  Last date to submit the application is 27th February 2017.  Results will be out by March 15th 2017.

  1. Do the students have a flexibility in joining date (exams etc.,)?
    The intern has to join the program before 31st May, and should spend at least 8 weeks.
  2. What do we mean by reference letter?
    It means a letter from a faculty member who has taught you a course, or have supervised you in a project.
  3. Eligibility criteria – students studying in various stages of UG/PG?
    Anybody actively enrolled in a degree program (UG/PG) will be eligible. If the student is graduating before the start of summer (May), he/she will not be eligible.
  4. Currently student, by start of the program one would get graduated, is this a constraint?
    See before
  5. If the documents to be uploaded crosses the size limit set at the website, how should a student provide the documents to the centre?
    Send a mail to with your files attached mentioning the reason for not uploading on the website.
  6. To whom should we write for any further queries regarding the program?
    Send your queries to
  7. Any accommodation will be provided to participants of the summer program?
    No accommodations will be provided to the participants.

A few more points to be noted:

These internship positions are industry sponsored and you will receive a sum of Rs 5000/- (Rupees five thousand) per month of your stay.

  1. You are expected to stay at the Centre for a minimum of 8 weeks. Requests for shorter internship periods will not be considered.
  2. You will be responsible for arranging your accommodation.
  3. An oral presentation would have to be made by you at the end of your stay.

Name of the student College
Arkadev Roy IIT Kharagpur
Praneeth Srivanth R IIT Madras
Sanmathi Kamath National Institute Of Technology, Surathkal
Rajarshi Khan IIT Kharagpur
Krishna Chaitanya IIT Madras
Archana Balan VIT University, Vellore,Tamil Nadu, India
Arun Mahesh B.M.S College Of Engineering. Karnataka
Anagha Kamath SVNIT, Surat
Varun Raj K    CUSAT
Aratrika Ghose NIT, Rourkela
Kiran Singh IIT Patna, Bihta,Bihar
Arthi Eswaran National Institute Of Technology,Tiruchirappalli
Jayanthi Akhil    National Institute Of Technology, Durgapur
Ankit Raj    Indian Institute Of Technology, Kanpur
Siddharth Lal    IIT Kanpur
Aamir Faisal Ansari Visvesvaraya National Institute Of Technology, Nagpur
Aditya Panda Jadavpur University
Neeraj Kaushal National Institute Of Technology, Hamirpur
Anukta Datta National Institute Of Technology, Rourkela
Ishan Sharma Birla Institute Of Technology And Science, Pilani
Shifa Nizami National Institute Of Technology, Uttarakhand
Mukul Sharma Indian Institute Of Technology- Banaras Hindu University(Varanasi)
Mahesh Yogi IIT Guwahati
Om Kesharwani National Institute Of Technology, Arunachal Pradesh

Name of the student College
Abhay Nayak LIT Madras
Abhijith R B.M.S College of Engineering, Bangalore
Adarsh Senapati IIT Guwahati
Akash Sinha National Institute of Technology, Durgapur, India
Anmol Jain National Institute of Technology, Hamirpur
Avratanu Ghosh Jadavpur University
Ayan Biswas IIT Kharagpur
Chittaranj an Baliarsingh National Institute of Technology, Rourkela
Gaurav Garg IIT Roorkee
Geethika Muralidharan International School of Photonics, Cochin University
Guillaume Blot Ecole Normale Superieure of Lyon
Harish K National Institute of Technology, Trichy
Mahathi Anand SRM University
Moullick Sonar College of Engineering, Pune
Omkar Mehta Institute of Chemical Technology
Rohm Mahapatra National Institute of Technology Sikki
Shashank Tripathi Birla Institute of Technology and Science, Pilani
Shivam Chopra PEC University of Technology
Shriddha Chaitanya National Institute of Technology, Surathkal
Sowmya L National Institute Of Technology Calicut
Subhajit Karmakar National Institute Of Technology, Delhi
Swayam Tibrewal VIT University
Vishwanathan Giridar IIT Madras
Washim Alam IIT Kharagpur

Name of the student College
Mallika Bariya Cornell University, New York
Madhav Gupta University of Southern California
Kunal Soni IISc Bangalore
Ani Jose Cochin University of Science and Technology
Kuldeep Reddy SRM University
Subhajit Mohanty IIT KANPUR
Pratyush Srivastava Maulana Azad National Institute of Technology, Bhopal
Saket Bhargava BITS – Pilani
Ameet Rajput Maulana Azad National Institute Of Technology
Dandamudi Chola Bhargava IIT, Guwahati
Arun Krishnadas IITM
Chhavi Choudhary IIT ROORKEE
Jishnu Dey IIT Kharagpur
Aranya Goswarai IIT, Kharagpur
Robin Singh National Institute Of Technology Karnataka, Swath
Arghya Patra IIT, Kharagpur

Name of the student College
Mayank Singh Mudgal IIT, Madras
Aneesh.Dash IIT, Bhubaneswar
Preeti.Deshpande Amity Institute of Nanotechnology
Vijay.Ramakrishnan NITK, Surathkal
Deepanshu Mishra IIT, Kanpur
Ravindra Jha NIT, Bhopal
Saee.Vyawahare BITS, Pilani
Sooraj.KP IISER, Bhopal
Vellaluru.Neeharika BITS, Pilani
Moab. Rajan Philip NITK, Surathkal
Himanshu.Jaiswal IIT, Jodhpur
Puneet Jain IIT, Roorkee
Punnag Padhy IIT, Bhubaneswar
Prithivirajan.S R IIT, Bhubaneswar
Soumya.Yandrapalli NITK, Surathkal