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Electric field induced patterning in Cr film under ambient conditions: A chemical reaction based perspective

TitleElectric field induced patterning in Cr film under ambient conditions: A chemical reaction based perspective
Publication TypeJournal Article
Year of Publication2020
AuthorsKumar, S, Suresh, H, Sethuraman, VA, Kumar, P, Pratap, R
JournalSN Applied Sciences
Volume2
Pagination1–9
KeywordsCr film; Chemical reaction; Electric field induced patterning; Electro-etching; Lithography under ambient conditions.
Abstract

Electric field induced “etching” of Cr film is a tip-based patterning technique that is used to create micro- and nano-sized trenches in the film under ambient conditions. The experimental data obtained in this study reveals that the “etching” of Cr occurs via the formation of water-soluble CrO3, which spontaneously forms at the cathode tip when a large electric field is applied using a pointed tip in the presence of humid air. By varying experimental conditions, such as vacuum level, gaseous environment, temperature, and humidity, the kinetics of the electric fieldinduced chemical reaction at the cathode was studied. Subsequently, the obtained insights wereincorporated into a model to explain the mechanism of the phenomenon. Water vapor in the air surrounding the tip acts as a limiting reactant in the third-order electrochemical oxidation of Cr to Cr2O3. Insights obtained in this study open new avenues for improving the repeatability of patterns generated through this technique.