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Experimental Study of the Influence of Process Pressure and Gas Composition on GaAs Etching Characteristics in Cl2/BCl3-Based Inductively Coupled Plasma

TitleExperimental Study of the Influence of Process Pressure and Gas Composition on GaAs Etching Characteristics in Cl2/BCl3-Based Inductively Coupled Plasma
Publication TypeJournal Article
Year of Publication2011
AuthorsRawal, DS, Sehgal, BK, Muralidharan, R, Malik, HK
JournalPlasma Science and Technology
Volume13