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Gate recess structure engineering using silicon-nitride-assisted process for increased breakdown voltage in pseudomorphic HEMTs

TitleGate recess structure engineering using silicon-nitride-assisted process for increased breakdown voltage in pseudomorphic HEMTs
Publication TypeJournal Article
Year of Publication2012
AuthorsK Bhat, M, Mandal, S, Pathak, S, G Saravanan, S, Sridhar, C, Badnikar, SL, Vyas, HP, Muralidharan, R, Jain, MK, Subrahmanyam, A
JournalSemicond. Sci. Technol
Volume27