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High-Performance Photonic Crystal Nanocavities on 300 mm SOI Substrate Fabricated With 193nm Immersion Lithography

TitleHigh-Performance Photonic Crystal Nanocavities on 300 mm SOI Substrate Fabricated With 193nm Immersion Lithography
Publication TypeJournal Article
Year of Publication2014
AuthorsXie, W, Fiers, M, Selvaraja, SK, Van Campenhout, J, Absil, P, Van Thourhout, D
JournalJournal of Lightwave technology
Volume32
Research Area: