NE 201 |
August - December |
Micro and Nano Characterization Methods |
This course provides training in the use of various device and material characterization techniques. Optical characterization: optical microscopy, thin film measurement, ellipsometry and Raman spectroscopy; Electrical characterization: Noise in electrical measurements, Resistivity with 2- probe, 4-probe and van der Pauw technique, Hall mobility, DC I-V and High frequency C-V characterization; Mechanical characterization: Laser Doppler vibrometry, Scanning acoustic microscopy, Optical profilometry, and Micro UTM; Material characterization: Scanning electron microscopy, Atomic force microscopy, XRD, and Focused ion beam machining.
Instructors: Akshay Naik and Manoj Varma.
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NE 202 |
August - December |
Micro and Nano Fabrication |
This course is designed to give training in device processing at the cleanroom facility. Four specific modules will be covered to realize four different devices :
- p-n junction diode
- MOS capacitor
- MEMS Cantilever
- Microfluidic channel.
Instructors: Shankar Kumar Selvaraja and Sushobhan Avasthi
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NE 203 |
August - December |
Advanced micro- and nanofabrication technology and process |
Introduction and overview of micro and nano fabrication technology. Safety and contamination issues in a cleanroom. Overview of cleanroom hazards. Basic process flow structuring. Wafer type selection and cleaning methods. Additive fabrication processes. Material deposition methods. Overview of physical vapour deposition methods (thermal, e-beam, molecular beam evaporation) and chemical vapour deposition methods (PE-CVD, MOCVD, CBE, ALD). Pulsed laser deposition (PLD), pulsed electron deposition (PED). Doping: diffusion and ion implant techniques. Optical lithography fundamentals, contact lithography, stepper/canner lithography, holographic lithography, direct-laser writing. Lithography enhancement methods and lithography modelling. Non-optical lithography; E-beam lithography, ion beam patterning, bottom-up patterning techniques. Etching process: dry and wet. Wet etch fundamentals, isotropic, directional and anisotropic processes. Dry etching process fundamentals, plasma assisted etch process, Deep Reactive Ion Etching (DRIE), Through Silicon Vias (TSV). Isotropic release etch. Chemical-mechanical polishing (CMP), lapping and polishing. Packaging and assembly, protective encapsulating materials and their deposition. Wafer dicing, scribing and cleaving. Mechanical scribing and laser scribing, Wafer bonding, die-bonding. Wire bonding, die-bonding. Chip-mounting techniques.
Instructors: Shankar Kumar Selvaraja and Sushobhan Avasthi
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NE 205 |
August - December |
Semiconductor Devices and Integrated Circuit Technology |
This is a foundation level course in the area of electronic device technology. Band structure and carrier statistics, Intrinsic and extrinsic semiconductor, Carrier transport, p-n junction, Metal-semiconductor junction, Bipolar Junction Transistor, Heterojunction, MOS capacitor, Capacitance-Voltage characteristics, MOSFET, JEFET, Current-Voltage characteristics, Light Emitting Diode, Photodiode, Photovoltaics, Charge Coupled Device Integrated circuit processing, Oxidation, Ion implantation, Annealing, Diffusion, Wet etching and dry plasma etching, Physical vapour deposition, Chemical vapour deposition, Atomic layer deposition, Photolithography, Electron beam lithography, Chemical mechanical polishing, Electroplating, CMOS process integration, Moore’s law, CMOS technology scaling, Short channel effects, Introduction to Technology CAD, Device and Process simulation and modelling.
Instructor: Digbijoy N. Nath
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NE 213 |
August - December |
Introduction to Photonics |
This is a foundation level optics course which intends to prepare students to pursue advanced topics in more specialized areas of optics such as biophotonics, nanophotonics, non-linear optics etc. Classical and quantum descriptions of light, diffraction, interference, polarization. Fourier optics, holography, imaging, anisotropic materials, optical modulation, waveguides and fiber optics, coherence and lasers, plasmonics.
Instructors: Shankar Kumar Selvaraja and Ambarish Ghosh
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NE 215 |
August - December |
Applied Solid State Physics |
This course is intended to build a basic understanding of solid state science, on which much of modern device technology is built, and therefore includes elementary quantum mechanics. Review of Quantum Mechanics and solid state physics, Solution of Schrodinger equation for band structure, crystal potentials leading to crystal structure, reciprocal lattice, structure-property correlation, Crystal structures and defects, X-ray diffraction, lattice dynamics, Quantum mechanics and statistical mechanics, thermal properties, electrons in metals, semiconductors and insulators, magnetic properties, dielectric properties, confinement effects.
Instructors: Akshay Naik and S A Shiva Shankar
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NE 222 |
August - December |
MEMS: Modeling, Design, and Implementation |
This course discusses all aspects of MEMS technology – from modeling, design, fabrication, process integration, and final implementation. Modeling and design will cover blockset models of MEMS transducers, generally implemented in SIMULINK or MATLAB. Detailed multiphysics modeling may require COMSOL simulations. The course also covers MEMS specific micromachining concepts such as bulk micromachining, surface micromachining and related technologies, micromachining for high aspect ratio microstructures, glass and polymer micromachining, and wafer bonding technologies. Specific case studies covered include Pressure Sensors, Microphone, Accelerometers, Comb-drives for electrostatic actuation and sensing, and RF MEMS. Integration of micromachined mechanical devices with microelectronics circuits for complete implementation is also discussed.
Instructors: K.N. Bhat and Saurabh A. Chandorkar
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NE 223 |
August - December |
Analog Circuits and Embedded System for Sensors |
The Internet of Things (IoT) revolution is driven by confluence of high performance sensors, powerful computation power of microcontrollers and wireless technology. The performance of sensors is not only governed by inherent characteristics of sensor such as sensitivity, linearity and response time but also the front end interfacing analog circuit and backend processing in digital domain. The goal of this course is to explore the electronics that needs to be incorporated to create sensor systems and to learn the trade-offs in design of circuits to maximize performance subject to real life design constraints.
The course has both a theory (2 credits) and a hands-on lab (1 credit) element to it. The course starts out with introduction to basic circuit elements and smaller circuit building blocks with emphasis on reading and understand the datasheets for components to make the appropriate choice to pick for the circuit at hand. Digital IOs and some basics of digital logic will be explored thereafter leading eventually to programming with Arduino microcontroller. In the end, the course takes a closer look at building systems.
The lab portion of the course will serve to explore trade-offs in circuit design as well as give a practical feel for dealing with noise in circuits and building systems. Circuit simulation will also be emphasized in the lab course in conjunction with back of the envelop calculations to make sense of the simulations. There will be also be a final project wherein the students get an opportunity to build a sensor system in its entirety and learn planned system design, tracking down sources of noise and learning to define interfaces cleanly for smooth integration in the end.
The course content is as follows:
Basic Circuit Analysis and Passive Components; Introduction to semiconductor devices and circuits involving Diodes, BJT, MOSFET and JFET; Opamp circuits: Transimpedance amplifier, Instrumentation amplifier, Comparator, Precision DMM application; Tradeoffs between power, noise, settling time and cost; Survey of sensors and their datasheets; Active Filters and RF Oscillators; Introduction to digital logic, State Machines, Digital IO; Microcontroller programming; Communication protocols for sensor interfacing; System building
Instructors: Saurabh A. Chandorkar and Krishna Prasad
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NE 231 |
August - December |
Microfluidics |
This is a foundation course discussing various phenomena related to fluids and fluid-interfaces at micro-nano scale. This is a pre-requisite for advanced courses and research work related to micro-nano fluidics. Transport in fluids, equations of change, flow at micro-scale, hydraulic circuit analysis, passive scalar transport, potential fluid flow, stokes flow Electrostatics and electrodynamics, electroosmosis, electrical double layer (EDL), zeta potential, species and charge transport, particle electrophoresis, AC electrokinetics Surface tension, hysteresis and elasticity of triple line, wetting and long range forces, hydrodynamics of interfaces, surfactants, special interfaces Suspensions, rheology, nanofluidics, thick-EDL systems, DNA transport and analysis.
Instructor: Prosenjit Sen
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NE 241 |
August - December |
Material Synthesis: Quantum Dots To Bulk Crystals |
All device fabrication is preceded by material synthesis which in turn determines material microstructure, properties and device performance. The aim of this course is to introduce the student to the principles that help control growth. Crystallography; Surfaces and Interfaces; Thermodynamics, Kinetics, and Mechanisms of Nucleation and Growth of Crystals ; Applications to growth from solutions, melts and vapors (Chemical vapor deposition an Physical vapor deposition methods); Stress effects in film growth.
Instructor: Srinivasan Raghavan
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NE 250 |
August - December |
Entrepreneurship, Ethics and Societal Impact |
This course is intended to give an exposure to issues involved in translating the technologies from lab to the field. Various steps and issues involved in productization and business development will be clarified, drawing from experiences of successful entrepreneurs in high technology areas. The intricate relationship between technology, society and ethics will also be addressed with illustrations from people involved in working with the grass root levels of the society.
Instructor: Navakanta Bhat
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NE 312 |
August - December |
Nonlinear and Ultrafast Photonics |
This is an intermediate level optics course which builds on the background provided in “Introduction to photonics” offered in our department. Owing to the extensive use of nonlinear optical phenomena and Ultrafast lasers in various fields, we believe a good understanding of these principles is essential for students in all science and engineering disciplines, in particular students involved in the area of Photonics, RF and Microwave systems, Optical Instrumentation and Lightwave (Fiber-optic) Communications. In addition, this course intends to prepare students to pursue advanced topics in more specialized areas of optics such as Biomedical Imaging, Quantum optics, Intense field phenomena etc.
Instructor: V. R. Supradeepa
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