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S. Benedict and Bhat, N. , Plasma Oxidized Suspended Core-Shell Nanostructures for High Performance Metal Oxide Gas sensors, in 2019 Electron Devices Technology and Manufacturing Conference (EDTM), 2019.
K. B. Bharadwaj, Pratap, R. , and Raghavan, S. , Transfer free suspended graphene devices on silicon using electrodeposited copper, Journal of Vacuum Science and Technology B, vol. 32, p. 010603, 2014.
K. B Bharadwaj, Chandrasekar, H. , Nath, D. , Pratap, R. , and Raghavan, S. , Intrinsic limits of channel transport hysteresis in graphene-SiO2 interface and its dependence on graphene defect density, Journal of Physics D: Applied Physics, vol. 49, p. 265301, 2016.
S. D. B. Bhargav, Jorapur, N. , and Ananthasuresh, G. K. , Micro-scale Composite Compliant Mechanisms for Evaluating the Bulk Stiffness of MCF-7 Cells, Mechanism and Machine Theory, vol. 91, pp. 258–268, 2015.
S. D. B. Bhargav, Jorapur, N. , and Ananthasuresh, G. K. , Fabrication of Compliant Micro-Grippers using SU-8 with a Single Mask, Journal of the Institute of Smart Structures and Systems , vol. 3, pp. 7–14, 2015.
N. Bhat and Thakur, C. S. , Analog CMOS Performance Degradation due to Edge Direct Tunneling (EDT) Current in sub-100nm Technology, Journal of Semiconductor Technology and Science, 2003.
N. Bhat, Nanoelectronics Era: Novel Device Technologies Enabling Systems on Chip, Journal of the Indian Institute of Science, vol. 87, pp. 61–74, 2007.
N. Bhat and Saraswat, K. C. , Characterization of border trap generation in rapid thermally annealed oxides deposited using silane chemistry, Journal of Applied Physics, p. 2722, 1998.
M. K Bhat, Mandal, S. , Pathak, S. , G Saravanan, S. , Sridhar, C. , Badnikar, S. L. , Vyas, H. P. , Muralidharan, R. , Jain, M. K. , and Subrahmanyam, A. , Gate recess structure engineering using silicon-nitride-assisted process for increased breakdown voltage in pseudomorphic HEMTs, Semicond. Sci. Technol, vol. 27, 2012.
N. Bhat, Cao, M. , and Saraswat, K. C. , Bias temperature instability in hydrogenated thin-film transistors, IEEE Transactions on Electron Devices, p. 1102, 1997.
N. Bhat and Nandy, S. K. , Special Purpose Architecture for Accelerating Bitmap DRC, in Design Automation, 1989. 26th Conference on, 1989, pp. 674-677.
N. Bhat, Wang, A. , and Saraswat, K. C. , Rapid thermal anneal of gate oxides for low thermal budget TFTs, IEEE Transactions on Electron Devices, p. 63, 1999.
N. Bhat, Apte, P. P. , and Saraswat, K. C. , Charge trap generation in LPCVD oxides under high field stressing, IEEE Transactions on Electron Devices, p. 554, 1996.
S. G. Bhat and Kumar, P. S. A. , Room temperature electrical spin injection into GaAs by an oxide spin injector, Scientific Reports., vol. 4, 2014.
N. Bhat and Vasi, J. , Interface-state generation under radiation and high field stressing in reoxidized nitrided oxide MOS capacitors, IEEE Transactions on Nuclear Science, p. 2230, 1992.
N. Bhat, Jayaraman, B. , Pratap, R. , Bagga, S. , and Mohan, S. , Integrated CMOS gas sensors, in Electron Devices and Semiconductor Technology, 2009. IEDST '09. 2nd International Workshop on, 2009, pp. 1-5.
N. Bhat, MEMS for RF Applications, IETE Technical Review, vol. 21, 2004.
S. Bhattacharjee, Ganapathi, K. L. , Nath, D. N. , and Bhat, N. , Surface State Engineering of Metal/MoS2 Contacts Using Sulfur Treatment for Reduced Contact Resistance and Variability, IEEE Transactions on Electron Devices, vol. 63, pp. 2556-2562, 2016.
S. Bhattacharjee, Ganapathi, K. Lakshmi, Sharma, D. Ganesh, Sharma, A. , Mohan, S. , and Bhat, N. , Adaptive Transport in High Performance (I on), Steep Sub-Threshold Slope (SS< 60 mV/dec) MoS 2 Transistors, IEEE Transactions on Nanotechnology, vol. 18, pp. 1071–1078, 2019.
S. Bhattacharjee, Ganapathi, K. Lakshmi, Chandrasekar, H. , Paul, T. , Mohan, S. , Ghosh, A. , Raghavan, S. , and Bhat, N. , Nitride Dielectric Environments to Suppress Surface Optical Phonon Dominated Scattering in High-Performance Multilayer MoS2 FETs, Advanced Electronic Materials, vol. 3, 2017.
S. Bhattacharjee, Ganapathi, K. L. , Nath, D. N. , and Bhat, N. , Intrinsic Limit for Contact Resistance in Exfoliated Multilayered MoS2 FET, IEEE Electron Device Letters, vol. 37, pp. 119-122, 2016.
S. Bhattacharjee, Ganapathi, K. Lakshmi, Nath, D. N. , and Bhat, N. , Surface state engineering of metal/MoS 2 contacts using sulfur treatment for reduced contact resistance and variability, IEEE Transactions on Electron Devices, vol. 63, pp. 2556–2562, 2016.
S. Bhattacharjee, Ganapathi, K. Lakshmi, Mohan, S. , and Bhat, N. , A sub-thermionic MoS2 FET with tunable transport, Applied Physics Letters, vol. 111, p. 163501, 2017.
S. Bhattacharjee, Ganapathi, K. L. , Mohan, S. , and Bhat, N. , Interface Engineering of High-k Dielectrics and Metal Contacts for High Performance Top-Gated MoS2 FETs, ECS Transactions, vol. 80, pp. 101–107, 2017.
S. Bhattacharjee, Ganapathi, K. Lakshmi, Nath, D. N. , and Bhat, N. , Sulfur treatment for schottky barrier reduction in metal/MoS2 contacts: A new proposal for contact engineering on TMDs, arXiv preprint arXiv:1508.03795, 2015.

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